H2-O2触媒反応を利用した新規CVD法 1. 高品位酸化亜鉛薄膜の作製

西山 洋; 田村 一成; 三浦 仁嗣; 井上 泰宣

doi:10.14886/sssj2008.30.0.31.0

Abstract of annual meeting of the Surface Science of Japan

The Joint Annual Symposium of the Vacuum Society of Japan and the Surface Science Society of Japan (SVSS'10)
30th Annual Symposium of the Surface Science Society of Japan / 51th Annual Symposium of the Vacuum Society of Japan
The Vacuum Society of Japan / The Surface Science Society of Japan

Session ID : 4Bp-03

DOI https://doi.org/10.14886/sssj2008.30.0.31.0

Conference information

Host: the Vacuum Society of Japan and the Surface Science Society of Japan

November4

A new CVD method using H2 and O2 catalytic reaction. 1. Fabrication of high - quality ZnO thin films.

*Hiroshi Nishiyama, Kazunari Tamura, Hitoshi Miura, Yasunobu Inoue

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