Thin films of graphite were formed by chemical vapor deposition using two kinds of precursors, 2, 6-di (2', 6'-dimethy1-1'-naphthoyl)-naphthalene (0), and 2-methyl-1, 2'-naphtylketone (II). Structures of the films were studied by X-ray diffraction and Raman scattering spectra. The graphite formation temperatures on Ni using (0) and (II) were found to be above 800°C and 600°C, respectively. When the dehydrogenation from the starting materialis enhanced by Ni below 700°C, the graphite film could be obtained on the Ni substrate.
