抄録
Thin films of graphite-like layered materials containing boron, carbon and nitrogen (B/C/N materials) were prepared on substrates of Ni (111) single crystal and highly oriented pyrolytic graphite (HOPG) by low pressure CVD method using acrylonitrile and boron trichloride as starting materials. Electron spectroscopy for chemical analysis (ESCA) and reflective high energy electron diffraction (RHEED) suggest that highly oriented and crystalline thin film of B/C/N material deposited on Ni (111) substrate having catalytic ability, while small amount of B/C/N film deposited on a part of HOPG substrate. Transmission electron microscopy (TEM) indicates the B/C/N thin film had a layered structure whose ab-axis was parallel to the Ni (111) surface. These results of ESCA, RHEED and TEM strongly suggest that the B/C/N film deposited on Ni (111) substrate in a manner of hetero-epitaxial growth.
