定量的な鋼板表面深さ方向分析のためのスパッタリング収率の測定

抄録

Experiments were conducted to determine sputtering yields for various materials under a practical sputtering condition of Scanning Auger Microscopy (SAM) and Secondary Ion Mass Spectrometry (SIMS).
(1)Sputtering yields for Al, Ti, Cr, Mn, Fe, Ni, Cu, Zn, W and Ta are obtained for Ar⁺ ions with bulk specimens. The experimental value of each element is larger than that calculated with semi-empirical formula for normal incidence of Ar⁺ ions.
(2)Sputtering yields for Al, Cr, Mn, Fe and Ni are obtained for irradiation with O₂⁺ ions and N₂⁺ ions with bulk specimens.
(3)Sputtering yields for Al, Cr, Mn, Fe, Ni and Cu are obtained for irradiation with Ar⁺ ions, O₂⁺ ions and N₂⁺ ions with film specimens evaporated on stainless steel. These values nearly agree to those obtained with polycrystalline bulk specimens for each element.
(4)Spuuttering yield of Fe-Ni alloy for Ar⁺ ions increases with Ni concentration up to 25.6 mass%.
(5)Sputtering yield for Cr₂O₃ is obtained for Ar⁺ ions and O₂⁺ ions with the specimen prepared by thermal oxidation of Cr-evaporated glass with known coating weight.
Some of the results are applied to conversion of sputtering time to the sputtered amount in the depth-profiles. These results agree with those obtained with other techniques.