抄録
The monitoring of surface cleanliness of silicon waters is very important. Total Reflection X-ray Fluorescence is expected to be highly sensitive for the ultra trace contaminants on the top surface. Synchorotron radiation is an appropriate X-ray source. This method was applied to relatively heavy elements such as Cr, Fe, Ni, Zn, which were suffused on silicon wafer surfaces by spin coating technique. This method has been found to have high quantitativeness and its minimum detection limits for those elements was found to be the order of 1011 atoms/cm2. And this method was also found to be applicable to the real samples in the course of cleaning.
