Name : International Workshop on Ternary and Multinary Compounds
Location : [in Japanese]
Date : November 30, 2018 - December 01, 2018
Pages 47-50
The mist CVD method is a low cost thin film deposition process in a non-vacuum. Cu2SnS3 thin films were fabricated by mist CVD method and the thin films were analyzed by XRD, EPMA, SEM and transmittance and reflectance measurement. From the XRD result the deposited film contained (111) of monoclinic Cu2SnS3 and (101) of SnO2.