Journal of Ternary and Multinary Compounds
Online ISSN : 2758-2302
2018
Conference information

Fabrication of Cu2SnS3 thin film by mist CVD method
Mao KowataFumitaka YosihisaKunihiko Tanaka
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CONFERENCE PROCEEDINGS FREE ACCESS

Pages 47-50

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Abstract

The mist CVD method is a low cost thin film deposition process in a non-vacuum. Cu2SnS3 thin films were fabricated by mist CVD method and the thin films were analyzed by XRD, EPMA, SEM and transmittance and reflectance measurement. From the XRD result the deposited film contained (111) of monoclinic Cu2SnS3 and (101) of SnO2.

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© 2019 Professional Group of Multinary Compounds and Solar Cells
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