Name : International Workshop on Ternary and Multinary Compounds
Location : [in Japanese]
Date : December 12, 2020
Pages 35-39
To prevent exfoliation of Cu-Sn precursor, which deposited by fine channel mist CVD, from Mo coated substrate, annealed Mo coated substrate in N2 atmosphere was used. The prevent of exfoliation was considered to be due to MoO2 thin film grown on Mo by annealing in N2 atmosphere which decreases difference of coefficient of thermal expansion between Cu-Sn precursor and the substrate. After sulfurization, the Cu-Sn precursors showed X-ray diffraction peaks attributed to (133), (333) and (200) peaks of monoclinic Cu2SnS3.
