Abstract
We investigated the effects of substrate temperature on the deposition rates and the configuration of the hydrocarbon species in the film during film deposition in order to elucidate the film-deposition process. We have used infrared spectroscopy in multiple internal absorption reflection geometry (MIR-IRAS) to elucidate the configuration of the hydrocarbon species. The deposition rates drastically decreased as the substrate temperatures increased up to 200 °C. IRAS data revealed that the intensity of the peak due to the CH3 species decreased as the substrate temperature increased up to 200 °C. This suggested that the CH3 species preferentially decomposed and/or was etched during film growth at higher substrate temperatures.
