抄録
We investigated the effects of substrate temperature on the deposition rates and the configuration of the hydrocarbon species in the film during film deposition in order to elucidate the film-deposition process. We have used infrared spectroscopy in multiple internal absorption reflection geometry (MIR-IRAS) to elucidate the configuration of the hydrocarbon species. The deposition rates drastically decreased as the substrate temperatures increased up to 200 °C. IRAS data revealed that the intensity of the peak due to the CH3 species decreased as the substrate temperature increased up to 200 °C. This suggested that the CH3 species preferentially decomposed and/or was etched during film growth at higher substrate temperatures.
