Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Transmission X-ray Diffraction from Bismuth Lines Embedded in Silicon
Hiroo TajiriWataru YashiroOsami SakataKunihiro SakamotoKazushi Miki
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2008 年 33 巻 3 号 p. 619-622

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We have devoted our efforts toward developing transmission X-ray diffraction (TXD) for surface and interface from the viewpoint of realizing more efficient and precise structural analysis than the conventional surface X-ray diffraction. Here, we investigated bismuth lines embedded in a Si(001) substrate, which are promising templates applicable to nanometer-scale device, by TXD. In our experiments with synchrotron X-rays typical one-dimensional diffraction patterns were observed, which obviously indicates that the bismuth lines are still preserved in interface at the atomic scale.
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© 2008 The Materials Research Society of Japan
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