抄録
The x-ray reciprocal-lattice space imaging (X-ReSI) method is a single-exposure x-ray diffraction technique which records the reciprocal-lattice pattern of a fixed crystalline nanostructure using a 2D detector. The typical exposure time is a few seconds to a few minutes. We describe the methodology, instrumentation, and expressions used for geometrical analysis in this technique. The technique was applied to study buried Bi nanoline structures. The results of the application reveal that line structures in samples capped with an amorphous Si layer and having no cap layers still remained with a non-detectable amount of the 2 x n atomic structures though Bi nanolines embedded in Si was found to have a 2 x n superstructure having Bi dimer bonds. This underscores the strength of the x-ray reciprocal-lattice space imaging method as a point-and-shoot technique for quick structural analysis.
