Abstract
Lead zirconate titanate (PZT) films were deposited by inductively coupled plasma (ICP)-assisted aerosol deposition (AD) method. The influence of RF power was investigated for the deposition rate and microstructure of the PZT films. With our experimental deposition system, the deposition rate of PZT film was approximately l micro m/min when using the AD method without plasma assist. On the other hand, the deposition rate rose to over 10 micro m/min using the ICP-assisted AD method with an RF power of 800 W. The cross-sectional microstructure of the film was difference using an RF power of 800 W and that without plasma assistance.
