Preparation of LiMn₂O₄ Films by RF Magnetron Sputtering Method

Abstract

  Lithium-manganese oxides have been studied as a cathode material in the Li secondary batteries. Preparation of LiMn₂O₄ thin films was tried with a RF magnetron sputtering method at the substrate temperature (T_sub) of R.T.. This material is superior to other materials in the cost performance as well as non-toxicity. The dependence of crystal properties on the Ar flow rate was examined. In the case of 60 min deposition time, the deposition rate was not varied as varying Ar flow rate from 2 to 3.5 sccm.