Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Studies on Allergic Substance Elimination by RF Plasma Treatment
Yoshihito YagyuAkira HikidaNobuya HayashiHiroharu KawasakiTamiko OhshimaYoshiaki Suda
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2010 Volume 35 Issue 1 Pages 119-122

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Abstract
Allergic substances, which have higher stability to heat and an inhibition of an enzyme activity, such as ovomucoid, histamine and albumin, were treated by RF oxygen plasma. As a result of that, it was found that RF plasma, especially oxygen plasma, has ability of reducing the persistent allergic substances. Almost all of ovomucoid existing in egg white was removed by oxygen plasma. It was indicated that histamine was also removed by oxygen plasma irradiation. The reduction rate of allergen strongly relates to the irradiation period and was tended to be irrespective of the bond energy. The reduction rate of allergic proteins is indicated high in lower concentration and was significantly dependent on the initial concentration. It was suggested that plasma reacted to only the surface or surface layer of the allergic substances. The targets of plasma treatment in practical application are highly lower concentration because it is washed with water before exposure of plasma treatment process. The plasma irradiation is effective to treat an allergic substance and could be applied in practice.
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© 2010 The Materials Research Society of Japan
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