Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Regular Papers
Preparation of TiO2 thin films by RF magnetron sputtering method and their photocatalytic properties
M. IsaiT. ItoT. EndoT. SakaiY. Hoshi
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2010 Volume 35 Issue 4 Pages 901-904

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Abstract
Low-temperature preparation of the TiO2 thin films was examined by using a RF magnetron sputtering method. TiO2 films of anatase structure were prepared on the non-heated glass substrates. The photocatalytic properties of films were superior in the films prepared under the sputtering atmosphere of 10 Pa rather than 5 Pa. They showed high activities in the organic material-resolution characteristics. They also had high activity in the hydrophilicity characteristics.
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© 2010 The Materials Research Society of Japan
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