Abstract
The L10 ordering and microstructures of FePt films fabricated by gas flow sputtering using two heating methods, i.e., heating during deposition and post-annealing in vacuum, were studied. A 60-nm-thick film with an order parameter above 0.6 was obtained at a heating temperature of 300°C using both methods. While the film that is heated during sputtering consists of closely packed fibrous grains, the post-annealing method produces a film containing voids. The differences in the microstructures of the films fabricated by the two heating methods are explained by means of a structure zone model.
