Abstract
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. This research was designed for investigating the deposition condition of the films. The parameters were sputtering time, RF power, sputtering pressure and sputtering atmosphere. The LiMn2O4 films were deposited on the Al substrates, and their film properties were evaluated by X-ray diffraction. The film thickness was estimated by the gravimetry method. It was shown that the film thickness and the deposition rate were proportional to the Ar：O2 ratio as well as the sputtering time and the RF power. It was also shown that the deposition rate decreased as increasing the sputtering pressure.
