Investigation of deposition condition of LiMn₂O₄ films prepared by RF magnetron sputtering

抄録

  The LiMn₂O₄ films for Li secondary batteries have been prepared by a RF magnetron sputtering method. This research was designed for investigating the deposition condition of the films. The parameters were sputtering time, RF power, sputtering pressure and sputtering atmosphere. The LiMn₂O₄ films were deposited on the Al substrates, and their film properties were evaluated by X-ray diffraction. The film thickness was estimated by the gravimetry method. It was shown that the film thickness and the deposition rate were proportional to the Ar：O₂ ratio as well as the sputtering time and the RF power. It was also shown that the deposition rate decreased as increasing the sputtering pressure.