Fabrication of Zinc Oxide Nanostructures by Mist Chemical Vapor Deposition

抄録

ZnO nanostructures with well-controlled growth on silicon substrate were fabricated in a reducing gas ambient following by a novel mist chemical vapor deposition (Mist CVD) treatment. The effects of Mist CVD post-treatment time on the crystal growth, structural properties were investigated. It was found that the morphology of ZnO nanostructures was significantly modified and regrown during Mist CVD post-treatment process. The crystallinity of ZnO nanostructures was remarkably changed after Mist CVD post-treatment due to the huge regrowth of nanostructures. The mechanism of the nanostructures growth in Mist CVD was investigated in detail.