抄録
Adsorption states of tellurobezoates having telluro-carbonyl group were studied on Au(111) by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) measurements. XPS spectra show that the molecules form organic tellurium-oxide layers. Acids such as trifluoroacetic and sulfuric acid accelerate an accumulation of tellurium-oxide species originating from Te-phenyl tellurobenzoate molecules to cover the surfaces with thick layers, which indicate relatively high resistances. Conductive AFM revealed the high resistance of accumulated tellurium-oxide films and the disruptive strength against dielectric breakdown.
