抄録
Titanium oxide thin films were prepared by a pulsed laser deposition method using Ti and TiO2 powder and bulk targets. The deposition rate when using a powder target was higher than that in the case of a bulk target. These results may be caused as follows. The heat absorptivity of a powder target for the 532 nm laser light is higher than that of a bulk target. In addition, the net-ablation area of the powder target is larger than that of the bulk target. X-ray diffraction measurements suggest that the films prepared using the Ti and TiO2 powder target without substrate heating system are titanium oxide (TiOx : x=0～2). The diffraction patterns of the prepared films using powder targets indicated nearly the same properties as those of films prepared using Ti and TiO2 bulk targets. The results may be due to the target surface oxidation by laser ablation on the target surface.
