Regular Papers
Preparation of Sn doped SiO2 films using SiO2 and SnO2 mixture powder target by magnetron sputtering deposition
2017 年 42 巻 3 号 p. 73-76
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2017 年 42 巻 3 号 p. 73-76
Sn doped SiO2 thin films, which show strong luminescence by UV excitation, were prepared by a sputtering deposition method using a SnO2 and SiO2 powder mixed target. Optical emission spectrum of the plasma using powder target was almost same compared with the conventional sputtering deposition method SiO2 bulk target and Sn atoms were identified in the emission spectrum. XRD and XPS measurements suggest that Sn doped SiO2 thin films can be prepared using SnO2 and SiO2 mixture powder target, and their properties depend on the SiO2 mixture in the target.
