Effects of Pt Sacrificial Layer on Microfabrication in Layered Bismuth-based Ferroelectric Thin Films

Taiki Obayashi; Masafumi Kobune; Takuya Matsunaga; Ryo Ito; Tsubasa Migita; Takeyuki Kikuchi; Kensuke Kanda; Kazusuke Maenaka

doi:10.14723/tmrsj.45.31

Regular Papers

Effects of Pt Sacrificial Layer on Microfabrication in Layered Bismuth-based Ferroelectric Thin Films

Taiki Obayashi, Masafumi Kobune, Takuya Matsunaga, Ryo Ito, Tsubasa Migita, Takeyuki Kikuchi, Kensuke Kanda, Kazusuke Maenaka

著者情報

キーワード: magnetoelectric multiferroic, (Bi_3.25Nd_0.65Eu_0.10)Ti₃O₁₂, reactive ion etching, Pt sacrificial layer

ジャーナルフリー

2020 年 45 巻 2 号 p. 31-34

DOI https://doi.org/10.14723/tmrsj.45.31

詳細

抄録

Ferroelectric microrod films with a pitch size of 5 μm for micropillar-type multiferroic composite devices were fabricated by reactive ion etching (RIE) using epitaxial c-axis-oriented (Bi_3.25Nd_0.65Eu_0.10)Ti₃O₁₂ (BNEuT) thin films. The effects of the etching time, the presence of a 155-nm-thick sacrificial Pt layer and the thickness of this layer on the microstructure of the microrod films were examined. It was found that the use of the Pt layer during the RIE process allowed higher dimensional accuracy and straightness of the final microrod films.

責任著者(Corresponding author)

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