化学反応に支配された機械研磨メカニズムの解明：量子分子動力学シミュレーションと第一原理計算

尾澤 伸樹; 河口 健太郎; 久保 百司

doi:10.18914/tribologist.58.09_616

JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS

Online ISSN : 2189-9967
Print ISSN : 0915-1168
ISSN-L : 0915-1168

Explanation

Elucidation of Mechanical Polishing Mechanism Controlled by Chemical Reaction:Quantum Chemical Molecular Dynamics Simulation and First-Principles Calculation

Nobuki OZAWA, Kentaro KAWAGUCHI, Momoji KUBO

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Keywords: chemical mechanical polishing, tribology simulation, chemical reaction, tight-binding quantum chemical molecular dynamics, first-principles calculation

JOURNAL RESTRICTED ACCESS

2013 Volume 58 Issue 9 Pages 616-621

DOI https://doi.org/10.18914/tribologist.58.09_616

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