大口径KrFレーザーと画像解析の応用(画像変換装置)
1986 年 10 巻 6 号 p. 1-5
詳細
1986 年 10 巻 6 号 p. 1-5
A beam profile monitoring system has been applied to the analysis of ASE and deposition profile of a high power large aperture KrF laser. The spatial gain distribution measured by the image analysis method agreed very well to the deposition profile calculated by a Monte-Carlo computer simulation. The basic laser parameters, small signal gain, absorption and saturation intensity of 100J class KrF laser system under a high density pumping around lMW/cc was determined as a function of the Kr concentration of the gas mixture.
