A modified extended Tersoff interatomic potential function is proposed to simulate environment-assisted crack propagation behavior. First, the physical properties of Si, O
2, H
2, SiO
2, and H
2O were calculated by this modified function. It was confirmed that the calculated values agreed with the measured values very well. Next, the potential surface of the H
2O molecular transporting process to the crack tip of SiO
2 material was calculated by the same function. The relationship between the velocity of crack propagation "υ" and the stress intensity factor "
K" was calculated based on this surface. The results agreed with the experimental results well. This simulation clarified that the crack velocity is controlled by the H
2O transporting process in both regions I and II of the "υ-
K curve". In region I, H
2O molecules have physically limited access to the crack tip due to the small opening in the crack. This works as an energy barrier in transporting H
2O molecules. Due to the relatively large crack opening in region II, H
2O molecules have free access to the crack tip without any energy barrier. This difference makes a bend in the "υ-
K curve" between regions I and II.
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