Relationship between polishing pad surface temperature and removal rate in sapphire-chemical mechanical polishing
Released on J-STAGE: November 25, 2016 |
Volume 60
Issue 8
Pages 448-453
Michio UNEDA, Takahiro MATSUNAGA, Yoshihiro TAKAHASHI, Kazutaka SHIBUYA, Yoshio NAKAMURA, Daizo ICHIKAWA, Ken-ichi ISHIKAWA