Fundamentals of Processing Plasma
Released on J-STAGE: July 16, 2016 | Volume 59 Issue 7 Pages 161-170
Yukio OKAMOTO
Fundamentals of Plasma for Vacuum Engineers
Released on J-STAGE: August 25, 2014 | Volume 57 Issue 8 Pages 308-312
Takeo NAKANO
Fundamentals of Chemical Vapor Deposition Technologies
Released on J-STAGE: July 16, 2016 | Volume 59 Issue 7 Pages 171-183
Atsushi SEKIGUCHI
Vacuum Gauges and their Principles of Measurement
Released on J-STAGE: June 28, 2013 | Volume 56 Issue 6 Pages 220-226
Hitoshi AKIMICHI
Length Standard: Effects of Air Refractivity and Vacuum for a Laser Interferometer
Released on J-STAGE: July 15, 2009 | Volume 52 Issue 6 Pages 347-350
Souichi TELADA
Vacuum and Surface Science
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