Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Synthesis of Cyclized Copolymer from N-Substituted Dimethacrylamide and Application to a Photoresist with a Photo-Acid Generator
Yasuyuki Takao, Nobukazu Miyagawa, Shigeru Takahara, Tsuguo Yamaoka
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Keywords: cyclocopolymer, cyclized copolymerization, photoresist, N-substituted dimethacrylamide
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2000 Volume 13 Issue 2 Pages 207-210

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© The Technical Association of Photopolymers, Japan
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