表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
ニッケルめっきにおける塩化物イオンの役割
安田 光宏大野 湶春山 志郎
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1990 年 41 巻 3 号 p. 312-317

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The role of chloride ion in the plating of nickel has been studied by using a special electrolytic cell which permits continuous measurement of the amount of hydrogen evolved during electrodeposition. It was found that an increase in the concentration of chloride ion accelerated the deposition of nickel and inhibited the co-evolution of hydrogen, and these effects of chloride were especially remarkable at high pH values. The kinetic parameters for the electrodeposition of nickel were fully explained by a kinetic equation derived by assuming a chloride-containing adsorbed intermediate. It is considered highly probable that the number of effective sites for hydrogen evolution is reduced by adsorption of the reaction intermediate during the electrodeposition of nickel

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