Annals of Business Administrative Science
Online ISSN : 1347-4456
Print ISSN : 1347-4464
Rayleigh Criterion
The Paradigm of Photolithography Equipment
Nobuo TAKAHASHIHiroki KIKUCHI
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JOURNALS FREE ACCESS Advance online publication

Article ID: 0170525a

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Abstract

Photolithography equipment used in the manufacture of semiconductors has been predicted to hit a technological limit based on the Rayleigh criterion in terms of resolution. In actuality, however, the predicted limits of resolution are exceeded and increased microfabrication of photolithography equipment is achieved because of a change in the architecture from {mirror system, equal magnification, batch exposure} to {lens system, reduction, divided exposure}. Instead of using the Rayleigh criterion to make such predictions, experts use it to repeatedly generate “a set of recurrent and quasi-standard illustrations” as methods to improve resolution. The Rayleigh criterion itself is a typical example of what Kuhn (1962) termed a “community paradigm,” by which improvements to resolution were achieved by (a) increasing numerical aperture, (b) shortening wavelength, and (c) reducing the k1 factor.

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ABAS is supported by Grant-in-Aid for Publication of Scientific Research Results from the Japan Society for the Promotion of Science.

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