日本液晶学会討論会講演予稿集
Online ISSN : 2432-5988
Print ISSN : 1880-3490
ISSN-L : 1880-3490
2020年日本液晶学会オンライン研究発表会
セッションID: 2OB03
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UV光照射時の印加電圧の違いによるLong Pitch Super Twisted Nematic(LPSTN)構造の安定化条件
*大見 悟士伊藤 雅浩高頭 孝毅
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Long Pitch Super Twisted Nematic (LPSTN) has been stabilized which has a relationship d/p (d: cell thickness divided by chiral pitch) > 2.7 by polymer stabilization with an applied voltage near the clearing temperature. The LPSTN structure is a regular STN without voltage while it changes to reversed twisted nematic (RTN) over Fredericks voltage. We are going to report a stabilization condition of LPSTN and RTN structures depending on the pretilt angle and applied voltage with simulation data of Gibbs’ Free Energy.

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