Verification for Aluminum Multi-Charged Ions Generation Using ECR Ion Source - Providing a Place to Improve Educational Effects Through Highly Motivated Active Learning -

Seitatsu Onosaka; Syotaro Oue; Taku Shinohara; Tsubasa Nakamura; Daichi Ishii; Syo Itimiya; Shiori Kobayashi; Hiroya Uyama; Suzuka Fujita; Ayumu Inagaki; Toyohisa Asaji; Kazumasa Takahashi; Toru Sasaki; Takashi Kikuchi

doi:10.34468/gigaku.8.1_08004-1

Verification for Aluminum Multi-Charged Ions Generation Using ECR Ion Source

- Providing a Place to Improve Educational Effects Through Highly Motivated Active Learning -

Seitatsu Onosaka, Syotaro Oue, Taku Shinohara, Tsubasa Nakamura, Daichi Ishii, Syo Itimiya, Shiori Kobayashi, Hiroya Uyama, Suzuka Fujita, Ayumu Inagaki, Toyohisa Asaji, Kazumasa Takahashi, Toru Sasaki, Takashi Kikuchi

著者情報

Seitatsu Onosaka [日本]
National Institute of Technology, Oshima College [日本]
Syotaro Oue [日本]
National Institute of Technology, Oshima College [日本]
Taku Shinohara [日本]
National Institute of Technology, Oshima College [日本]
Tsubasa Nakamura [日本]
National Institute of Technology, Oshima College [日本]
Daichi Ishii [日本]
National Institute of Technology, Oita College [日本]
Syo Itimiya [日本]
National Institute of Technology, Toyama College [日本]
Shiori Kobayashi [日本]
National Institute of Technology, Toyama College [日本]
Hiroya Uyama [日本]
Nagaoka University of Technology [日本]
Suzuka Fujita [日本]
Nagaoka University of Technology [日本]
Ayumu Inagaki [日本]
National Institute of Technology, Oita College [日本]
Toyohisa Asaji [日本]
National Institute of Technology, Toyama College [日本]
Kazumasa Takahashi [日本]
Nagaoka University of Technology [日本]
National Institute of Technology, Oita College [日本]
Toru Sasaki [日本]
Nagaoka University of Technology [日本]
Takashi Kikuchi [日本]
Nagaoka University of Technology [日本]

ジャーナルオープンアクセス

2021 年 8 巻 1 号 p. 08004-1-08004-8

DOI https://doi.org/10.34468/gigaku.8.1_08004-1

詳細

抄録

During semiconductor manufacturing, ions are injected into SiC, which is a common substrate material. Conventional ion-injection methods require high voltage to accelerate ions. This voltage can be decreased using multi-charged ions. In our laboratory, we can achieve ion injection via an electron cyclotron resonance ion source, which is relatively inexpensive compared with other ion sources and capable of generating multi-charged ions. The present research was conducted to improve the production rate of Ar7+, which has an ionization energy close to that of Al4+, and generate aluminum ions. The ion-extraction voltage and confinement time were optimized by adjusting the magnetic field in the chamber. The generation of aluminum ions could be confirmed using a sputtering source, and the usefulness of the latter was validated via the formation of the former. Research results were shared with plural KOSENs and the Nagaoka University of Technology students through Zoom, and we successfully confirmed the educational effect of the model core curriculum and development of the general-purpose abilities of the students.

責任著者(Corresponding author)

J-STAGEへの登録はこちら（無料）