2024 Volume 144 Issue 3 Pages 234-239
We fabricated high forward and low leakage current trench MOS-type Schottky barrier diodes (MOSSBDs) on a 12-μm-thick epitaxial layer grown by halide vapor phase epitaxy on β-Ga2O3(001) substrate. The MOSSBDs, measuring 1.7×1.7 mm2, exhibited a forward current of 2 A (70 A/cm2) at 2 V forward voltage and a leakage current of 2×10-8 A/cm2 at -1.2 kV reverse voltage (on/off current ratio of > 109) with an ideality factor of 1.05 and wafer-level specific on-resistance of 17.1 mΩ·cm2. These results indicate that the MOSSBD is promising for practical high-voltage (AC 400 V) power applications.
The transactions of the Institute of Electrical Engineers of Japan.C
The Journal of the Institute of Electrical Engineers of Japan