Recent Researches of Plasma-based Ion Implantation and Deposition in Japan

Abstract

Plasma-based ion implantation technology has been developed for more than 15 years. Recently, the technology has been accompanied by deposition onto a substrate immersed in a metal or semi-metal plasma. The process using this hybrid system is actively researched for cost-effective and simple modification system, in particular, in Japan. Recent trend of plasma-based ion implantation and deposition from hardware of the apparatus to applications through fundamental researches is introduced in the article.