A Novel Sputter System with Dynamically Controlled Plasma

抄録

Abstract - A new type of plasma system based on the Magnetic Neutral Loop Discharge (NLD) concept has been developed for sputter application. This system is characterized by plasma production around the magnetic null field on the target surface, where an RF electric field is applied. From the experimental results and numerical analysis of electron behavior in this system, we found that electrons around the magnetic null region on the target surface moved in meandering orbits like in the original NLD concept. Varying the magnetic flux density of magnets and their arrangement can control effective electron heating around the null region.