電気学会論文誌A(基礎・材料・共通部門誌)
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Special Issue Paper
Rare Gas Metastable Atom Density in Diluted O2 RF Plasmas
Takeshi KitajimaKei TakahashiToshiki NakanoToshiaki Makabe
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ジャーナル フリー

2006 年 126 巻 1 号 p. 37-42

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抄録
Rare gas diluted O2 plasmas are gaining interests for application to high quality SiO2 film formation. The density of rare gas metastable atoms and O atom in rare gas diluted O2 radio frequency (RF) capacitively coupled plasma (CCP) was measured by optical absorption spectroscopy (OAS). Decreases of rare gas metastable densities due to addition of O2 indicate efficient O atom production by rare gas metastables via collisional quenching. Krypton metastable had highest density among four rare gas species for fixed RF power. The decrease of Ar metastable density due to O2 addition showed quantitative agreement with reported quenching rate coefficient. Detailed discussion on different gas pressures illustrates reduced O2 fraction is the key for selective production of O atoms through rare gas metastables.
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© 2006 by the Institute of Electrical Engineers of Japan
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