Evaluation of Nanopulse Plasma and its Application to DLC Film Deposition

Abstract

The nanopulse CVD method open the way of DLC deposition at sub-atmospheric pressure. On the other hand, plasma characteristics of nanopulse plasma have not investigated yet. In this paper, we have investigated the plasma characteristics of nanopulse plasma using the Langmuir probe method at low pressure. Using of the characteristics of high electron density created by positive pulse, we have developed the bipolar nanopulse generator consisted with Static Induction Thyristor devices. The deposition rate of this bipolar nanopulse plasma CVD method is five fold higher than that of normal unipolar pulse CVD method. The productivity of plasma assisted coating will be significantly improved by this bipolar nanopulse CVD method.