抄録
The plasma-ion processing of three-dimensional components tends to expand various fields from microelectronics to environmental industries. The recent trend is not only surface modification by thin film prepared by reactive deposition using a metallic plasma source generated in reactive gases, but also deep layer ion-penetration of the component using thermal diffusion. The substrates are immersed in the plasma and are pulse-biased with a low voltage. This article introduces the plasma-ion processing for three dimensional components, and its merits and drawbacks, and examples of the applications are also shown.
