IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Special Issue Paper
Microwave-excited Blowing Plasmas using Microstrip Lines for Atmospheric Pressure CVD
Jaeho KimDongmin KimHiroyuki OhsakiMakoto Katsurai
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2010 Volume 130 Issue 10 Pages 913-918

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Abstract
Chemical vapor depositions using nonthermal atmospheric pressure plasmas have attracted special attentions because they eliminate expensive and complicated vacuum systems and provide many more active chemical species. We report an advanced 2.45 GHz microwave-excited blowing plasma system which was fabricated using microstrip lines, instead of conventional waveguides. The plasma system provides a plasma source with a long lifetime, stability, robustness, and simplicity even at atmospheric pressure. The blowing plasma permits the carbon materials deposition in atmospheric ambient air.
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© 2010 by the Institute of Electrical Engineers of Japan
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