Mechanical Properties of the Carbonaceous Films Formed by Focused Ion-beam-assisted Chemical Vapor Deposition

Abstract

The hardness and Young's modulus of the carbonaceous films formed by focused ion-beam-assisted chemical vapor deposition using Au or Si ions, before and after 800 °C annealing, were compared with those formed using Ga ions in the process. It is found that the hardness of the film formed using Au ions was harder than those formed using Si and Ga ions before annealing. After annealing, however, that formed using Si ions showed the largest value in hardness. From the X-ray photoelectron spectroscopy measurement, the implanted Si atoms were combined with carbon atoms chemically, indicating the hardening of the Si-containing carbonaceous films after annealing.