Preparation of HfO₂ Thin Films using Flashing Spray CVD Method

Abstract

The authors proposed a novel chemical vapor deposition system, a new evaporation supply method by using flash boiling spray, to improve several kinds of problems such as the decomposition of the precursor at supply line and evaporator. In this paper, the relation between film surface condition and injection quantity was investigated. Tetraethyl methyl amino hafnium and n-pentane were used as the mixed solution, and HfO₂ film was deposited on Si substrate by using this method. As a result, the film surface roughness and grain size are increased as increasing injection quantity.