抄録
We describe recent trends of plasma engineering on two topics - the infrared spectroscopy of plasma process and plasma processing technologies in graphene research. First, we show the measurement of plasma process with the infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS). This method is a very powerful tool of monitoring of plasma process, because the method has high detection sensitivity and the method can be applied to “in-situ” and “real-time” monitoring of interaction of plasma with material surface. We describe the monitoring method, acquired IR spectra and analysis methods. Second, we show plasma technologies for graphene; graphene has been considered one of key materials in a 21st century industries. For the achievement of graphene applications, various processing technologies have been required. Plasma processings are expected to become essential tools in graphene industries because they can provide answers to the requirement for low-temperature processing and the desirability of dry process.
