Deposition of Hydrophilic Amorphous Carbon Film with Ether as a Source Molecule and Analysis of its Deposition Reaction

Abstract

A hydrophilic amorphous carbon film was deposited with plasma enhanced chemical vapor deposition (PECVD) using diisopropylether ((i-C₃H₇)₂O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp³-hydrocarbon components, which is the same as the isopropy group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.