空冷を伴うバリア放電による緑豆の成長促進

抄録

This paper describes results on growth promotion of bean sprouts by dielectric barrier discharge (DBD) treatment in air. Before cultivation, the mung beans between glass plates are exposed to DBD plasma produced by ac square voltage for 20 min. It is possible to increase in the growth speed of the bean sprouts by the DBD with an adequate voltage height. However, excess thermal stimulation produced by the higher electrical stress to the seeds results in the reduction of the growth speed. Statistical significance of the effect of DBD on the growth promotion can be observed when the seeds between the glass plates are cooled by ventilation with a blower. These results imply that the DBD treatment without the thermal stress can be a useful method to reduce the cultivation period of the bean sprouts in agricultural industry.