MOD法による炭素熱還元を用いたVO₂薄膜の作製条件の検討

抄録

Vanadium dioxide (VO₂) thin films were fabricated by metal-organic decomposition (MOD). To utilize a carbon thermal reduction for obtaining a VO₂ composition, the precursor films were fabricated at the temperature T_p from 300 to 380ºC in a N₂ atmosphere. From the measurement results of XRD, diffraction peaks indicating VO₂ phase were observed with a wide range of firing temperatures from T_f=560 to 620ºC. Furthermore, the peaks indicating VO₂ phase were also observed with a wide range of firing time from t_f=15-45 min. Regarding the surface morphology of the films, the nanoparticles of 100-200 nm were densely packed although small spaces existed between the particles. The R-T characteristics of the films indicated the phase transition with a rapid resistance change of about three orders of magnitude and hysteresis loop. From these experimental results, it was found that wide windows of firing conditions for fabricating VO₂ thin film can be obtained in the MOD process using the carbon thermal reduction.