IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Amorphous Silicon Thin Film Transistors Prepared by Plasma Enhanced Chemical Vapor Deposition
Kaichi Fukuda, Nobuki Ibaraki
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1990 Volume 110 Issue 10 Pages 659-666

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