磁場中における非定常高周波放電プラズマヘのマイクロ波入射の効果

抄録

The rf and microwave discharges have been utilized widely in the field of plasma processing. However, the discharges have been produced by either rf or microwave power and there has been very few experimental study for the discharge produced by both rf and microwave power.
In this paper, when microwave power was injected into a magnetized non-stationary plasma, which was generated by an inductively coupled rf discharge, the effect of the microwave injection is investigated experimentally. From the experimental results, the effect appears as a microwave discharge when an electron cyclotron 2nd harmonic resonance layer exists in vacuum chamber. The discharge due to the 2nd harmonic resonance does not occur by the microwave field alone. But, if there exist the plasma generated by an rf discharge, the microwave discharge occurs by this resonance in the latter-half period of an rf discharge pulse.