抄録
In order to produce large-diameter uniform plasmas, we have proposed two plasma sources; a plane electron-cyclotronresonance (ECR) slotted antenna (PESA) source for the ECR plasma production and a modified magnetron-typed (MMT) radio frequency (RF) source for the RF plasma production. The PESA has magnet rings behind the slotted antenna to provide magnetic field for the ECR. The MMT RF source provides high density uniform plasmas with a help of the LC resonance of auxiliary electrode placed parallel to the substrate. Both plasma sources produce large-diameter uniform plasmas over more than 30 cm in diameter.
We have proposed a grid method for electron temperature control. By applying a negative dc voltage to the grid which separates a plasma processing region from a plasma production region, the electron temperature is decreased by one or two orders of magnitude in the processing region. The same effect is obtained by changing mesh size of a floating grid. The change of a slit between two grids also causes a variation of the electron temperature. These techniques are quite effective for a chemical reaction control in processing plasmas.
