IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Soft Magnetic Properties of Fe-Si-Al-Ni Thin Films Having Nano-Crystallization
Yoshio UtsushikawaGo KondoKiyozumi Niizuma
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2000 Volume 120 Issue 2 Pages 174-179

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Abstract
In order to improve the soft magnetic properties of SuperSendust I, [SS(I)], we tried to decrease the grain size by RF sputtering using an Ar+N2 mixed gases. An SS(I) thin film prepared in pure Ar plasma shows the following magnetic properties; saturation magnetization, Ms=1.52T, coercive force, Hc=3.18×103A/m, in-plane magnetic anisotropy, K//=5.4 ×103J/m3, average grain size, t=16.6nm and exchange stiffness constant, A=12.2×10-13J/m.
SS(I)-N thin films prepared in Ar+4%N2 plasma show good soft magnetic properties such as HC=0.16×103A/m, μr=520, K//=2.7×103J/m3, t=10.7nm and A=4.96×10-13J/m. And it was also found that coercive force, Hc of SS(I)-N films decrease with decreasing grain size, tand in-plane magnetic anisotropy, K//, and Hc are related to tand K// by following equations; Hc∝t6 and Hc∝K//4. This suggests that RF sputtering in Ar+N2 plasma can improve the soft magnetic properties of SS(I) thin films.
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